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Více informací o knize In Situ Process Diagnostics and Intelligent Materials Processing: Volume 502

• Parametry knihy
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Anotace knihy

This book focuses on the rapidly developing field of sensor technology for process monitoring and control during fabrication of advanced materials and structures. Research in sensor driven, closed-loop control of the fabrication process (i.e., process-state monitoring), as well as product-state (e.g., wafer-state) monitoring are discussed. Featured are process techniques that include chemical vapor deposition (CVD), metalorganic chemical vapor deposition (MOCVD), plasma-enhanced chemical vapor deposition (PECVD), molecular beam epitaxy (MBE), rapid thermal processing (RTP), reactive-ion and plasma etching, electron beam evaporation, pulsed laser deposition (PLD), and sputtering. Materials of interest include electronic and optical thin films such as semiconductors, epitaxial oxides, metals and dielectrics, as well as particles and nanostructured materials. Sensing techniques for monitoring variables such as temperature, composition, optical properties, film thickness and particle-size distribution are highlighted. Topics include: sensor technologies and semiconductor diagnostics; sensor technologies and thin-film diagnostics; in situ diagnostics of oxide film growth and processes and intelligent processing of electronic ceramics.

Parametry knihy

Zařazení knihy Knihy v angličtině Technology, engineering, agriculture Mechanical engineering & materials Materials science

• Plný název: In Situ Process Diagnostics and Intelligent Materials Processing: Volume 502
• Autor: Peter A. RosenthalWalter M. DuncanJohn A. Woollam
• Jazyk: Angličtina
• Vazba: Pevná
• Počet stran: 308
• EAN: 9781558994072
• ISBN: 1558994076
• ID: 02060154
• Nakladatelství: Cambridge University Press
• Hmotnost: 580 g
• Rozměry: 229 × 152 × 19 mm
• Datum vydání: 17. July 1998

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